Particle Measuring Systems cleans up surface contamination
Particle Measuring Systems has launched a new monitor for the real-time detection of traces of surface molecular contamination on silicon dioxide or metallic surfaces in ultra-clean environments. Contamination, for example in the form of chemical films, can change the electrical, optical and physical properties of the product surface, damaging the end product. This results in loss of yield and potentially product failure, so early detection and identification of contamination sources is key to reducing the costs associated with downtime and rework. Monitoring surface molecular contamination is a relatively new concept and is critical to understanding how the net effect of complex air chemistries, environmental conditions and the chemical/physical nature of the surface are affected.
Using surface acoustic wave technology, Particle Measuring Systems' AiM-100 system enables contaminants to be detected before they significantly damage product and process surfaces. The two key performance benefits of the AiM-100 are high mass sensitivity together with real-time data output. The system monitors deposition mass, deposition rate, ambient temperature and relative humidity, with data displayed and tracked via Facility Net, a powerful facility monitoring software by Particle Measuring Systems. In addition to use in ultra-clean environments, the instrumentation can also be used to protect valuable optics against organic hazes in photolithography, or aerospace applications and can monitor copper and other metallic surfaces for corrosion. Requiring low capital investment, AiM-100 can be used either as a stand-alone monitor, or as part of an integrated facility monitoring system.