Particle Measuring Systems launches first tool for monitoring performance in minienvironments
Particle Measuring Systems (PMS) has launched the first minienvironment
monitor designed specifically for monitoring particles and other factors
critical to the performance of minienvironments. Minienvironments are
controlled, ultra-clean environments which surround individual tools used
for processing semiconductor wafers, and must be kept free from contaminants.
As semiconductor manufacturers move from 200mm to 300mm wafers in an attempt
to reduce costs, cleaner environments are essential to prevent contamination
during the manufacturing process. Effective monitoring of these new minienvironments
is a key issue if the cost benefits are to be obtained.
Designed by applications engineers at PMS, MiniNet uses a patented ensemble manifold which collects particles from up to seven locations, thereby monitoring the entire environment around the device, rather than just a single location. The system, which can measure particles down to 0.3 microns, can be located either inside or outside the minienvironment and samples taken using an optional internal pump or house vacuum. Information on particles, differential air pressure and other critical factors such as air flow velocity are all transmitted via a single Ethernet signal to facility monitoring software, also from PMS, which enables easy data analysis, report generation and alarming.